The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Jul. 17, 2023
Chongqing Huapu Scientific Instrument Co., Ltd., Chongqing, CN;
Roi Optoelectronics Technology Co, Ltd., Shanghai, CN;
Yunnan Huapu Quantum Material Co., Ltd, Yunnan, CN;
Chongqing Huapu Quantum Technology Co., Ltd., Chongqing, CN;
East China Normal University, Shanghai, CN;
Chongqing Institute of East China Normal University, Chongqing, CN;
CHONGQING HUAPU SCIENTIFIC INSTRUMENT CO., LTD., Chongqing, CN;
ROI OPTOELECTRONICS TECHNOLOGY CO, LTD., Shanghai, CN;
YUNNAN HUAPU QUANTUM MATERIAL CO., LTD, Yunnan, CN;
CHONGQING HUAPU QUANTUM TECHNOLOGY CO., LTD., Chongqing, CN;
EAST CHINA NORMAL UNIVERSITY, Shanghai, CN;
CHONGQING INSTITUTE OF EAST CHINA NORMAL UNIVERSITY, Chongqing, CN;
Abstract
A method for film coating by pulsed laser deposition with a plasma grating includes: in step 1, providing a substrate and a target material; in step 2, generating a femtosecond pulsed laser beam which is split by a beam splitting module so as to form a plurality of femtosecond pulsed laser sub-beams; in step 3, performing a first excitation on the target material by one of the split femtosecond pulsed laser sub-beams as a pre-pulse after focus, to generate a first plasma; in step 4, synchronizing the rest of the split femtosecond pulsed laser sub-beams as post-pulses to form, after focus, filaments arriving at a surface of the target material simultaneously, to generate the plasma grating; and in step 5, performing a secondary excitation on the target material by the generated plasma grating to generate a second plasma depositing on the substrate to form the film.