The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Apr. 26, 2022
SK Microworks Co., Ltd., Gyeonggi-do, KR;
Dae Seong Oh, Gyeonggi-do, KR;
Han Jun Kim, Gyeonggi-do, KR;
Sun Hwan Kim, Gyeonggi-do, KR;
Heung Sik Kim, Gyeonggi-do, KR;
Jin Woo Lee, Gyeonggi-do, KR;
SK MICROWORKS CO., LTD., Gyeonggi-do, KR;
Abstract
The embodiments provide a polyamide-based film, which comprises a polyamide-based polymer and has a light resistance index of 0.660 GPa-1 or less as represented by the following Equation 1, whereby it has excellent mechanical properties, optical properties, and light resistance. [Equation 1] Light resistance index=ΔYI/Y. In Equation 1, Y is the modulus of the film, and ΔYI is the rate of change in yellow index (YI) of the film before and after a light resistance test in which UV rays are irradiated to the film at 60° C., the UV irradiation is stopped, and water is sprayed at 50° C.