The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Dec. 27, 2018
Applicant:
Kemira Oyj, Helsinki, FI;
Inventors:
Xiaoyu Chen, Shanghai, CN;
Xuan Li, Shanghai, CN;
Assignee:
[object Object];
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 212/08 (2006.01); C08F 2/22 (2006.01); C08F 8/42 (2006.01); C08F 220/18 (2006.01); C08F 230/08 (2006.01); C08F 292/00 (2006.01); C08L 3/02 (2006.01);
U.S. Cl.
CPC ...
C08F 212/08 (2013.01); C08F 2/22 (2013.01); C08F 8/42 (2013.01); C08F 220/1804 (2020.02); C08F 230/085 (2020.02); C08L 3/02 (2013.01);
Abstract
The invention relates to a polymer having a main chain which is obtained by free radical emulsion polymerisation of a monomer mixture, which comprises at least one optionally substituted styrene, at least one C1-C4 alkyl (meth)acrylate and at least one ethylenically unsaturated monomer. The monomer mixture is polymerised in a reaction mixture comprising a natural and/or synthetic polymeric stabilizer. According to the invention the polymer main chain further comprises a reaction product of silica sol and an unsaturated organosilicon compound. The invention relates also to methods of making such polymer.