The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

Apr. 18, 2023
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Karl William Koch, III, Elmira, NY (US);

Charles Andrew Paulson, Painted Post, NY (US);

James Joseph Price, Corning, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 17/34 (2006.01); C03C 3/091 (2006.01); C03C 17/245 (2006.01); C03C 21/00 (2006.01); C23C 14/34 (2006.01); G02B 1/10 (2015.01); G02B 1/14 (2015.01);
U.S. Cl.
CPC ...
C03C 17/3435 (2013.01); C03C 3/091 (2013.01); C03C 17/245 (2013.01); C03C 17/3411 (2013.01); C03C 21/002 (2013.01); C23C 14/34 (2013.01); C23C 14/3442 (2013.01); G02B 1/10 (2013.01); G02B 1/14 (2015.01); C03C 2217/78 (2013.01); C03C 2217/91 (2013.01); Y10T 428/2495 (2015.01); Y10T 428/31612 (2015.04);
Abstract

One or more aspects of the disclosure pertain to an article including an optical film structure disposed on an inorganic oxide substrate, which may include a strengthened or non-strengthened substrate that may be amorphous or crystalline, such that the article exhibits scratch resistance and retains the same or improved optical properties as the inorganic oxide substrate, without the optical film structure disposed thereon. In one or more embodiments, the article exhibits an average transmittance of 85% or more, over the visible spectrum (e.g., 380 nm-780 nm). Embodiments of the optical film structure include aluminum-containing oxides, aluminum-containing oxy-nitrides, aluminum-containing nitrides (e.g., AlN) and combinations thereof. The optical film structures disclosed herein also include a transparent dielectric including oxides such as silicon oxide, germanium oxide, aluminum oxide and a combination thereof. Methods of forming such articles are also provided.


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