The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

Mar. 31, 2021
Applicant:

Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno, 's-Gravenhage, NL;

Inventor:

Rob Jacob Hendriks, Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 7/02 (2019.01); C03C 17/34 (2006.01); C23C 14/08 (2006.01); C23C 14/10 (2006.01); C23C 14/28 (2006.01);
U.S. Cl.
CPC ...
C03C 17/3417 (2013.01); C23C 14/081 (2013.01); C23C 14/083 (2013.01); C23C 14/10 (2013.01); C23C 14/28 (2013.01); C03C 2217/734 (2013.01); C03C 2218/151 (2013.01);
Abstract

A plate including functional material to be deposited onto a target surface using monochromatic radiation having a wavelength is described. The plate further includes a substrate with a first surface directed towards the target surface and with a second surface to receive the monochromatic radiation. The first surface is patterned with recessed areas that have a dielectric coating and that are filled with the functional material. The dielectric coating includes a sequence of dielectric coating layers alternating in refractive index. The dielectric coating therewith has a relatively high reflectivity for said monochromatic radiation incident perpendicular to the dielectric coating in comparison to a reflectivity for said monochromatic radiation incident at an angle of 45 degrees to the dielectric coating. As such shear forces are mitigated without requiring a high alignment accuracy. The present application further describes a deposition device including the plate and a method involving the plate.


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