The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

Jun. 14, 2022
Applicant:

University of South Florida, Tampa, FL (US);

Inventors:

Dharendra Yogi Goswami, Tampa, FL (US);

Mohammed Khaleel M. Alhussain, Tampa, FL (US);

Assignee:

University of South Florida, Tampa, FL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/00 (2006.01); B01J 21/06 (2006.01); B01J 21/08 (2006.01); B01J 31/38 (2006.01); B01J 35/39 (2024.01); B01J 37/02 (2006.01); B01J 37/04 (2006.01); B05D 3/00 (2006.01);
U.S. Cl.
CPC ...
B01J 21/063 (2013.01); B01J 21/08 (2013.01); B01J 35/39 (2024.01); B01J 37/0219 (2013.01); B01J 37/0228 (2013.01); B01J 37/0244 (2013.01); B01J 37/04 (2013.01);
Abstract

Described herein relates to methods for optimizing a transmittance and/or a self-cleaning property of a substrate using a self-cleaning coating. As such, the substrate may be treated using a photocatalytic reaction of titanium dioxide (hereinafter 'TiO')-based solution via a light treatment. The substrate may be treated using a combination including but not limited to wet chemicals, dry-cleaning, and/or mechanical polishing. Additionally, the substrate may then be overlayed with a self-cleaning coating, such that the transmittance and the self-cleaning properties of the substrate may be optimized. Furthermore, the methods for optimizing the transmittance and/or the self-cleaning functionality of the substrate may also enhance self-cleaning, anti-fouling, anti-fogging, anti-icing characteristics of the substrate.


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