The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Aug. 19, 2022
Lutronic Corporation, Goyang, KR;
Kwang Chon Ko, Paju, KR;
LUTRONIC CORPORATION, Goyang, KR;
Abstract
The present invention relates to an RF treatment apparatus controlling the RF energy so that the target tissue is maintained within a range of a treatment temperature if the target tissue is determined to have reached the treatment temperature based on the impedance, a method of controlling the RF treatment apparatus, and a skin treatment method using RF energy. The RF treatment apparatus, the method of controlling the RF treatment apparatus and the skin treatment method using RF energy according to the present invention have an effect in that they can improve the accuracy and efficiency of treatment because whether a target tissue corresponds to a treatment temperature is determined based on impedance of the tissue and the volume of the target tissue corresponding to the treatment temperature can be maximized while maintaining the target tissue to the treatment temperature for a predetermined time.