The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

Jun. 01, 2021
Applicant:

Nanjing Forestry University, Suzhou, CN;

Inventors:

Chao Deng, Suzhou, CN;

Farzad Seidi, Suzhou, CN;

Qiang Yong, Suzhou, CN;

Xiangyu Jin, Suzhou, CN;

Chengcheng Li, Suzhou, CN;

Haiying Wei, Suzhou, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D06M 13/328 (2006.01); A41D 13/11 (2006.01); B32B 5/02 (2006.01); B32B 5/26 (2006.01); B32B 7/02 (2019.01); D04H 1/26 (2012.01); D04H 1/425 (2012.01); D04H 1/4291 (2012.01); D04H 1/4374 (2012.01); D04H 1/4382 (2012.01); D04H 1/492 (2012.01); D04H 3/16 (2006.01); D06M 13/355 (2006.01); D06M 13/395 (2006.01); D06M 16/00 (2006.01); D06M 101/30 (2006.01);
U.S. Cl.
CPC ...
A41D 13/1192 (2013.01); B32B 5/022 (2013.01); B32B 5/269 (2021.05); B32B 5/271 (2021.05); B32B 7/02 (2013.01); D04H 1/26 (2013.01); D04H 1/425 (2013.01); D04H 1/4291 (2013.01); D04H 1/4374 (2013.01); D04H 1/43835 (2020.05); D04H 1/43838 (2020.05); D04H 1/492 (2013.01); D04H 3/16 (2013.01); D06M 13/328 (2013.01); D06M 13/355 (2013.01); D06M 13/395 (2013.01); D06M 16/00 (2013.01); A41D 2500/30 (2013.01); B01D 2239/0618 (2013.01); B01D 2239/0627 (2013.01); B01D 2239/0663 (2013.01); B32B 2250/03 (2013.01); B32B 2250/20 (2013.01); B32B 2262/0253 (2013.01); B32B 2262/04 (2013.01); B32B 2262/062 (2013.01); B32B 2262/067 (2013.01); B32B 2262/144 (2021.05); B32B 2262/16 (2021.05); B32B 2307/7163 (2013.01); B32B 2307/718 (2013.01); B32B 2571/00 (2013.01); D06M 2101/30 (2013.01); D10B 2321/022 (2013.01); D10B 2401/13 (2013.01); D10B 2509/00 (2013.01);
Abstract

An antibacterial and antiviral degradable mask and a manufacturing method thereof are provided. From outside to inside, the mask sequentially comprises a surface layer (), a core layer (), and an inner layer () that contacts the face; the surface layer () is made of an antibacterial and antiviral cellulose spunlace non-woven fabric; the core layer () is made of a polypropylene melt-blown non-woven fabric; the inner layer () is made of a polypropylene spunbond non-woven fabric or a degradable natural cotton fabric. The mask can have both antibacterial and antiviral functions; moreover, the material is degradable, and thus, environmental pollution pressure caused by non-degradable petroleum-based fiber materials such as polypropylene can be effectively relieved.


Find Patent Forward Citations

Deng, Chao. (2025). Antibacterial and antiviral degradable mask and manufacturing method thereof (U.S. Patent No. 12193532). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12193532

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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