The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Jan. 23, 2020
Veeva Systems Inc., Pleasanton, CA (US);
Scott Edward Mitreuter, Brick, NJ (US);
Andrew Han, Needham, MA (US);
Bobby Ng, San Ramon, CA (US);
Katharyn A. Wilber, Philadelphia, PA (US);
Veeva Systems Inc., Pleasanton, CA (US);
Abstract
Systems and methods for sharing updates in two repositories in a content management system. The two repositories may be configured to have a number of integration points, and a message server may send integration point messages between the repositories at these integration points. The first integration point message may be creating an event in the RIM repository, the second integration point message may be reviewing an RIM impact assessment report, the third integration point message may be executing an approved change control implementation plan, and the fourth integration point message may be updating the approved change control implementation plan with refile activity lifecycle statuses from the RIM repository. The updates automatically shared between the repositories can provide users of one repository visibility on another repository, and can help users to avoid delays in the process, duplication of efforts, and errors.