The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Nov. 16, 2022
National Tsing Hua University, Hsinchu, TW;
Andrew Hing Cheong Kung, Taipei, TW;
Pei-Chi Huang, Yunlin County, TW;
Chih-Hsuan Lu, Hsinchu, TW;
Ming-Chang Chen, Kaohsiung, TW;
NATIONAL TSING HUA UNIVERSITY, Hsinchu, TW;
Abstract
An EUV radiation light source generation apparatus includes a pump laser, at least one pulse shaping unit, a wavelength conversion unit, and a high-order harmonics generation unit. The pump laser provides a pulse laser radiation beam. Each pulse shaping unit conducts a spectrum extending operation and a phase compensation operation to the pulse laser radiation beam. The phase compensation operation makes multiple frequency components of the pulse laser radiation beam emitted by the pulse shaping unit to be substantially in phase. The wavelength conversion unit conducts a center wavelength conversion operation to the pulse laser radiation beam. The high-order harmonics generation unit receives the pulse laser radiation beam processed by the pulse shaping unit and the center wavelength conversion operation, and focuses the received pulse laser radiation beam to a high order harmonic generation medium to generate a high order harmonic radiation beam.