The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2025

Filed:

Dec. 20, 2021
Applicant:

Nichia Corporation, Anan, JP;

Inventors:

Hiroki Abe, Komatsushima, JP;

Tomoya Yamashita, Anan, JP;

Kenji Uchida, Anan, JP;

Assignee:

NICHIA CORPORATION, Anan, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); H01L 33/32 (2010.01);
U.S. Cl.
CPC ...
H01L 33/32 (2013.01); H01L 33/0075 (2013.01);
Abstract

A nitride semiconductor light emitting element includes: n-side and p-side nitride semiconductor layers; and an active layer. The active layer includes a plurality of well layers and a plurality of barrier layers. The plurality of well layers include first well layers, and second well layers positioned closer to the p-side nitride semiconductor layer than the first well layers. At least one of the plurality of barrier layers positioned between the first well layers and at least one of the plurality of barrier layers positioned between the second well layers respectively include a first barrier layer containing an n-type impurity, and a second barrier layer, wherein a concentration of the n-type impurity in the second barrier layer is lower than a concentration of the n-type impurity in the first barrier layer, and wherein the second barrier layer is positioned closer to the p-side nitride semiconductor layer than the first barrier layer.


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