The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Dec. 27, 2021
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Tapash Chakraborty, Maharashtra, IN;
Robert Jan Visser, Menlo Park, CA (US);
Prerna Goradia, Mumbai, IN;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/455 (2006.01); H01L 21/3105 (2006.01); B05D 1/00 (2006.01); B05D 1/36 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02118 (2013.01); C23C 16/45553 (2013.01); H01L 21/0228 (2013.01); H01L 21/02304 (2013.01); H01L 21/02312 (2013.01); H01L 21/3105 (2013.01); B05D 1/36 (2013.01); B05D 1/60 (2013.01);
Abstract
Embodiments of the disclosure relate to methods of selectively depositing organic and hybrid organic/inorganic layers. More particularly, embodiments of the disclosure are directed to methods of modifying hydroxyl terminated surfaces for selective deposition of molecular layer organic and hybrid organic/inorganic films. Additional embodiments of the disclosure relate to cyclic compounds for use in molecular layer deposition processes.