The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2025

Filed:

Feb. 15, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jeong Jin Hong, Yongin, KR;

Sang Hong Kim, Seoul, KR;

Mihyun Jang, Seoul, KR;

Jin Kyeong Lee, Seoul, KR;

Sejune Cheon, Seoul, KR;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); G05B 23/02 (2006.01); G06N 20/20 (2019.01);
U.S. Cl.
CPC ...
H01J 37/32963 (2013.01); G05B 23/0283 (2013.01); G06N 20/20 (2019.01); H01J 37/32926 (2013.01);
Abstract

The subject matter of this specification can be implemented in, among other things, methods, systems, computer-readable storage medium. A method can include receiving (i) sensor data indicating a first state of an environment of a processing chamber processing a substrate subsequent to a chamber recovery procedure, and (ii) substrate process data indicating a set of process parameter values associated with performing a substrate processing procedure by the processing chamber having the environment in a second state prior to the chamber recovery procedure. The method further includes processing the sensor data and the substrate process data using one or more machine learning models to determine one or more outputs. The one or more outputs include an update to at least one of the set of process parameter values. The update is associated with performing the substrate processing procedure by the processing chamber having the environment in the first state.


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