The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
May. 27, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Tyler Wills, Marblehead, MA (US);
George M. Gammel, Marblehead, MA (US);
Eric Donald Wilson, Rockport, MA (US);
Jay T. Scheuer, Rowley, MA (US);
Xiangdong He, Westborough, MA (US);
Shardul Patel, North Reading, MA (US);
Robert C. Lindberg, Rockport, MA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Provided herein are approaches for optimizing a full horizontal scanned beam distance of an accelerator beam. In one approach, a method may include positioning a first Faraday cup along a first side of an intended beam-scan area, positioning a second Faraday cup along a second side of the intended beam-scan area, scanning an ion beam along the first and second sides of the intended beam-scan area, measuring a first beam current of the ion beam at the first Faraday cup and measuring a second beam current of the ion beam at the second Faraday cup, and determining an optimal scan distance of the ion beam across the intended beam-scan area based on the first beam current and the second beam current.