The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
May. 22, 2020
Stanley Electric Co., Ltd., Tokyo, JP;
Hirofumi Chiba, Tokyo, JP;
STANLEY ELECTRIC CO., LTD., Tokyo, JP;
Abstract
A manufacturing method for an optical deflector, in which a piezoelectric film layer having a uniform film thickness is formed on a substrate layer, includes forming a cavity to open to a SiOlayer side in a forming region of an outside piezoelectric actuator by etching an SOI wafer from the SiOlayer side, covering an exposed surface of the cavity with a SiOlayer, and joining the SiOlayer of the SOI wafer and a support layer of an SOI wafer to manufacture an SOI wafer in which the cavity is enclosed. Next, after a recess is formed on a back side of the SOI wafer, anisotropic dry etching is carried out from the back side in a depth direction of the recess to remove the SiOlayer.