The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Jun. 04, 2020
Applicant:
Kuraray Co., Ltd., Kurashiki, JP;
Inventors:
Mitsuru Kato, Kurashiki, JP;
Hirofumi Kikuchi, Kurashiki, JP;
Chihiro Okamoto, Kurashiki, JP;
Shinya Kato, Tokyo, JP;
Assignee:
KURARAY CO., LTD., Kurashiki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/24 (2012.01); B24B 37/26 (2012.01); B24B 53/017 (2012.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01); B24B 37/26 (2013.01); B24B 53/017 (2013.01);
Abstract
Disclosed is a polishing pad including a polishing layer having a polishing surface, wherein the polishing surface includes a deep-groove region having a first pattern formed by a deep groove or hole having a depth of 0.3 mm or more, and a land region that is a region other than the deep-groove region, and the land region includes shallow recesses having a second pattern and a depth of 0.01 to 0.1 mm, and a plurality of island-like land portions surrounded by the shallow recesses and having a maximum distance in a horizontal direction of 8 mm or less.