The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2025

Filed:

Jun. 07, 2022
Applicant:

Baui Biotech Co., Ltd., New Taipei, TW;

Inventors:

Yu-Sheng Lin, New Taipei, TW;

Kuo-Wei Tseng, New Taipei, TW;

Chiung-Chyi Shen, Taichung, TW;

Meng-Yin Yang, Taichung, TW;

Assignee:

BAUI Biotech Co., Ltd., New Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 17/70 (2006.01);
U.S. Cl.
CPC ...
A61B 17/7067 (2013.01); A61B 17/7065 (2013.01); A61B 17/7068 (2013.01);
Abstract

The present disclosure provides an interspinous process device. The interspinous process device may include a main body having a cavity formed therein, the main body being configured to be disposed between the two adjacent spinous processes; and a spacer configured to be arranged in the cavity of the main body. When the main body is disposed between the two adjacent spinous processes and the spacer is arranged in the cavity of the main body, a volume of the cavity may be greater than a volume of the spacer, a height of the cavity may be equal to a height of the spacer, and a width of the cavity may be greater than a width of the spacer.


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