The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

Aug. 30, 2022
Applicant:

Nanya Technology Corporation, New Taipei, TW;

Inventor:

Ying-Cheng Chuang, Taoyuan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 99/00 (2023.01); H10B 12/00 (2023.01);
U.S. Cl.
CPC ...
H10B 99/00 (2023.02); H10B 12/488 (2023.02);
Abstract

A semiconductor memory device manufacturing method includes: sequentially forming a lower oxide layer, a word line metal layer and an upper oxide layer over at least a portion of a memory cell; forming a through hole passing through the upper oxide layer, the word line metal layer and the lower oxide layer to expose the portion of the memory cell; forming a sacrificial pillar into the through hole; removing the upper oxide layer to expose a top portion of the sacrificial pillar; sequentially forming a first oxide spacer sidewall, a nitride spacer sidewall and a second oxide spacer sidewall on a sidewall of the top portion of the sacrificial pillar; removing the nitride spacer sidewall to form a void gap; etching the word line metal layer through the void gap to form separate word lines.


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