The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

Jun. 24, 2022
Applicant:

Nanya Technology Corporation, New Taipei, TW;

Inventor:

Tzu-Ching Tsai, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/08 (2023.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 22/26 (2013.01); G06N 3/08 (2013.01); H01L 21/67253 (2013.01); H01L 22/12 (2013.01);
Abstract

The present application discloses an implanting system. The implanting system includes an etch module executing a first implanting recipe on a first wafer to turn a first wafer state of the first wafer to a second wafer state; a first measurement module collecting the second wafer state of the first wafer to generate a first set of data; and an artificial intelligence module coupled to the first measurement module and the etch module, analyzing the first set of data and update the first implanting recipe to a second implanting recipe when the first set of data is not within a predetermined range. The artificial intelligence module is configured for generating the second implanting recipe taking into consideration at least one of an implanting rate of the second wafer, a rate of rotation of the second wafer, and a tilt angle of the second wafer.


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