The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

Jun. 18, 2018
Applicant:

Cytiva Sweden Ab, Uppsala, SE;

Inventors:

Krishna Kumar Swaminathan, Bangalore Karnataka, IN;

Sridhar Dasaratha, Bangalore Karnataka, IN;

Sittal George, Bangalore Karnataka, IN;

Vinay Bhaskar Jammu, Bangalore Karnataka, IN;

Alok Singh Chauhan, Bangalore Karnataka, IN;

Nagaraju Konduru, Bangalore Karnataka, IN;

Neelima Boddapati, Bangalore Karnataka, IN;

Ankita Bhatia, Bangalore Karnataka, IN;

Mithilesh Mohanty, Bangalore Karnataka, IN;

Harsha Aeron, Bangalore Karnataka, IN;

Andreas Castan, Uppsala, SE;

Assignee:

Cytiva Sweden AB, Uppsala, SE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 30/20 (2020.01);
U.S. Cl.
CPC ...
G06F 30/20 (2020.01);
Abstract

The present invention relates to a method for predicting outcome of a process used for manufacturing a sample in a bioreactor, the process belonging to a category. The method comprises selecting () a process model based on the category; accessing () historic data related to past process runs for manufacturing the sample; accessing () current data obtained () from a current process run of the process. The obtained current data, which is based on the selected process model, comprises: process strategy data, bioreactor instrument data, data from online sensors and/or data from offline sensors. The method further comprises predicting () an outcome of at least one selected parameter of the current process run for manufacturing the sample based on the accessed historic data and current data. The present invention also relates to a method for modelling a process and a control system () for controlling a process.


Find Patent Forward Citations

Loading…