The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

Oct. 22, 2021
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventor:

Takayuki Naono, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G02B 26/08 (2006.01); G02B 26/10 (2006.01);
U.S. Cl.
CPC ...
G02B 26/101 (2013.01); G02B 26/0858 (2013.01);
Abstract

In a micromirror device, the upper electrode of the piezoelectric element consists of a plurality of individual electrode parts, each of which is separated by a first stress inversion region and a second stress inversion region. In the first stress inversion region, positive and negative, of a principal stress component having a maximum absolute value among a principal stress, are inverted in a maximum displacement state, in a case of driving in a first resonance mode in which the mirror part is tilted and oscillated around the first axis. In the second stress inversion region, positive and negative, of a principal stress component having a maximum absolute value among a principal stress, are inverted, in a case of driving in a second resonance mode in which the mirror part is tilted and oscillated around the second axis.


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