The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2024
Filed:
Dec. 04, 2019
Ateliers Busch SA, Chevenez, CH;
Ateliers Busch SA, Chevenez, CH;
Abstract
The present invention relates to a redundant vacuum pumping system () and a pumping method using this system, comprising a primary roots pump (), a first pumping sub-system () and a second pumping sub-system (), wherein the first pumping sub-system () and the second pumping sub-system () are arranged to pump in parallel the gas evacuated by the primary roots pump (), the first pumping sub-system () comprising a first secondary roots pump () and a first positive displacement pump () and a first valve () positioned between the gas discharge outlet () of the primary roots pump () and the gas suction inlet () of the first secondary roots pump (), and the second pumping sub-system () comprising a second secondary roots pump () and a second positive displacement pump () and a second valve () positioned between the gas discharge outlet () of the primary roots pump () and the gas suction inlet () of the second secondary roots pump (). According to the invention, the first pumping sub-system () and the second pumping sub-system () are configured to pump at a same flow rate, and the primary roots pump () is configured to be able to pump at a flow rate F equal to the pumping flow rate of the primary pumping sub-system () plus the pumping flow rate of the secondary pumping sub-system ().