The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2024
Filed:
Mar. 29, 2021
Ionautics Ab, Öjebyn, SE;
Daniel Lundin, Linköping, SE;
Ulf Helmersson, Brokind, SE;
IONAUTICS AB, Öjebyn, SE;
Abstract
A method () for monitoring process conditions in a plasma PVD process as well as a method () for controlling a plasma PVD process are disclosed. The methods are performed in an apparatus () configured therefore. In accordance with the methods, an oscillating voltage signal is applied to a target (), arranged in the apparatus (), by means of a radio frequency generator). The response from the applied oscillating voltage signal is recorded by means of a radio frequency sensor (). Based on the recorded response, information regarding at least one plasma process condition is derived. A computer program and a computer-readable medium are also disclosed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile