The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

Mar. 12, 2022
Applicants:

Shinichiroh Satoh, Tokyo, JP;

Naoki Oya, Kanagawa, JP;

Inventors:

Shinichiroh Satoh, Tokyo, JP;

Naoki Oya, Kanagawa, JP;

Assignee:

Ricoh Company, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22F 10/14 (2021.01); B29C 64/165 (2017.01); B29K 29/00 (2006.01); B29K 505/02 (2006.01); B33Y 10/00 (2015.01);
U.S. Cl.
CPC ...
B22F 10/14 (2021.01); B29C 64/165 (2017.08); B33Y 10/00 (2014.12); B22F 2301/052 (2013.01); B29K 2029/00 (2013.01); B29K 2505/02 (2013.01);
Abstract

Provided is an object producing method including a powder layer forming step of forming a layer of a powder containing sinterable particles, an object forming liquid applying step of applying an object forming liquid to the layer of the powder to form an object forming region, and a sintering inhibiting liquid applying step of applying a sintering inhibiting liquid to the layer of the powder to form a sintering inhibited region in which sintering of the particles is inhibited, and includes a layer laminating step of sequentially repeating these steps to form a laminate. The object forming region and the sintering inhibited region adjoin each other. The sintering inhibiting liquid contains a first resin. The sintering inhibited region contains the first resin or a second resin derived from the first resin. A predicted amount of a residue calculated by a predetermined method is 800 ppm or greater.


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