The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

May. 16, 2019
Applicant:

The Board of Trustees of the Leland Stanford Junior University, Stanford, CA (US);

Inventors:

Geoffrey C. Gurtner, Portola Valley, CA (US);

Sun Hyung Kwon, Stanford, CA (US);

Mohammed Inayathullah Nazir Ahmed, Santa Clara, CA (US);

Jayakumar Rajadas, Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61L 27/56 (2006.01); A61L 27/24 (2006.01); A61L 27/52 (2006.01); A61L 27/54 (2006.01);
U.S. Cl.
CPC ...
A61L 27/56 (2013.01); A61L 27/24 (2013.01); A61L 27/52 (2013.01); A61L 27/54 (2013.01); A61L 2300/204 (2013.01); A61L 2430/18 (2013.01); A61L 2430/34 (2013.01);
Abstract

The formation of scars at a wound site is reduced by contacting the wound site with an effective dose of an inhibitor of focal adhesion kinase (FAK) formulated in a pullulan hydrogel The release profile of the FAK inhibitor can be adjusted according to the nature of the wound, e.g., excisional wounds, burn wounds, etc.


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