The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2024
Filed:
Aug. 31, 2021
Applicant:
Samsung Display Co., Ltd., Yongin-si, KR;
Inventors:
Assignee:
SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 71/16 (2023.01); C23C 14/04 (2006.01); C23C 16/04 (2006.01); G03F 7/00 (2006.01); H10K 59/12 (2023.01); H10K 71/00 (2023.01);
U.S. Cl.
CPC ...
H10K 71/166 (2023.02); C23C 14/042 (2013.01); C23C 16/042 (2013.01); G03F 7/0015 (2013.01); H10K 59/12 (2023.02); H10K 71/00 (2023.02); H10K 71/164 (2023.02);
Abstract
A manufacturing method of a mask includes forming a first mask layer, forming a second mask layer on the first mask layer, forming a photoresist pattern layer on the second mask layer, removing a first area of the second mask layer, which is exposed through the photoresist pattern layer, defining an opening through the first mask layer, removing a portion of the photoresist pattern layer to expose a portion of a second area of the second mask layer, and removing the portion of the second area of the second mask layer.