The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2024
Filed:
Dec. 08, 2022
Fujifilm Corporation, Tokyo, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
There are provided a lens device, an imaging apparatus, and an imaging method that suppress the occurrence of overexposure by dimming or blocking totally reflected light. The lens device () includes: an optical system (A); a wavelength polarizing filter unit () that is disposed at a pupil position of the optical system (A) or near the pupil position and includes a plurality of aperture regions, a plurality of optical filters that are disposed in the plurality of aperture regions and include two or more optical filters transmitting lights having a part of wavelength ranges different from each other, and a plurality of first polarizing filters that are disposed in the plurality of aperture regions and are at least two first polarizing filters having polarization directions different from each other; and a first circularly polarizing optical element () that is provided between a subject and the wavelength polarizing filter unit.