The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2024

Filed:

Mar. 21, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Hyewon Moon, Seongnam-si, KR;

Jiyeon Kim, Hwaseong-si, KR;

Minjung Son, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/73 (2017.01); G06N 3/08 (2023.01);
U.S. Cl.
CPC ...
G06T 7/74 (2017.01); G06N 3/08 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30244 (2013.01);
Abstract

A method with global localization includes: extracting a feature by applying an input image to a first network; estimating a coordinate map corresponding to the input image by applying the extracted feature to a second network; and estimating a pose corresponding to the input image based on the estimated coordinate map, wherein either one or both of the first network and the second network is trained based on either one or both of: a first generative adversarial network (GAN) loss determined based on a first feature extracted by the first network based on a synthetic image determined by three-dimensional (3D) map data and a second feature extracted by the first network based on a real image; and a second GAN loss determined based on a first coordinate map estimated by the second network based on the first feature and a second coordinate map estimated by the second network based on the second feature.


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