The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2024

Filed:

Aug. 28, 2019
Applicant:

National Center for Nanoscience and Technology, China, Beijing, CN;

Inventor:

Xiaojun Li, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); B29C 33/38 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1857 (2013.01); B29C 33/3842 (2013.01); G03F 7/0002 (2013.01); G03F 7/0005 (2013.01);
Abstract

Some embodiments of the present disclosure relate to a manufacturing method using nano-imprint lithography for a diffraction grating waveguide of a near-eye display. The manufacturing method includes: manufacturing an imprint lithography template with a diffraction grating waveguide pattern; transferring the diffraction grating waveguide pattern of the imprint lithography template to a transferring template by nano-imprint lithography, so as to obtain a transferring template with a reverse pattern of the diffraction grating waveguide pattern; and transferring the reverse pattern of the diffraction grating waveguide pattern of the transferring template to a waveguide substrate by nano-imprint lithography, so as to obtain the diffraction grating waveguide of the near-eye display.


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