The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2024

Filed:

Aug. 31, 2020
Applicants:

National Research Council of Canada, Ottawa, CA;

The Governors of the University of Alberta, Edmonton, CA;

Inventors:

Robert A. Wolkow, Edmonton, CA;

Jason Pitters, Ottawa, CA;

Mark Salomons, Ottawa, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 10/02 (2010.01); G01Q 10/04 (2010.01); H02N 2/02 (2006.01);
U.S. Cl.
CPC ...
G01Q 10/02 (2013.01); G01Q 10/04 (2013.01); H02N 2/025 (2013.01);
Abstract

A nano-positioning system for fine and coarse nano-positioning including at least one actuator, wherein the at least one actuator includes a high Curie temperature material and wherein the nano-positioning system is configured to apply a voltage to the at least one actuator to generate fine and/or coarse motion by the at least one actuator. The nano-positioning system being a stand-alone system, a scanning probe microscope, or an attachment to an existing microscope configured to perform a method of creepless nano-positioning that includes positioning a probe relative to a first area of a substrate using coarse stepping and interacting with the first area of the substrate using fine motion after less than 60 seconds of the positioning the probe. The movement of the scanning probe microscope is actuated by a high Curie temperature piezoelectric material that limits and/or eliminates creep, hysteresis and aging.


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