The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2024
Filed:
Feb. 24, 2021
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Amir Kajbafvala, Chandler, AZ (US);
Caleb Miskin, Mesa, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/24 (2006.01); C23C 16/42 (2006.01); C23C 16/44 (2006.01); C23C 16/52 (2006.01); C23C 16/56 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45557 (2013.01); C23C 16/24 (2013.01); C23C 16/42 (2013.01); C23C 16/4404 (2013.01); C23C 16/45553 (2013.01); C23C 16/52 (2013.01); C23C 16/56 (2013.01); H01L 21/02381 (2013.01); H01L 21/02532 (2013.01); H01L 21/0262 (2013.01);
Abstract
A method of depositing one or more epitaxial material layers, a device structure formed using the method and a system for performing the method are disclosed. Exemplary methods include coating a surface of a reaction chamber with a precoat material, processing a number of substrates, and then cleaning the reaction chamber.