The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2024
Filed:
Feb. 08, 2021
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Won Sang Kwon, Daejeon, KR;
Jung Eun Kim, Daejeon, KR;
Jung Su Han, Daejeon, KR;
Seung Uk Yeu, Daejeon, KR;
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 9/04 (2006.01); B29C 41/14 (2006.01); B29K 105/00 (2006.01); B29L 31/48 (2006.01); C08F 2/26 (2006.01); C08F 220/06 (2006.01);
U.S. Cl.
CPC ...
C08L 9/04 (2013.01); B29C 41/14 (2013.01); C08F 2/26 (2013.01); C08F 220/06 (2013.01); B29K 2105/0064 (2013.01); B29L 2031/4864 (2013.01);
Abstract
A carboxylic acid-modified nitrile-based copolymer latex includes a carboxylic acid-modified nitrile-based copolymer including: 65.5 wt % to 82.5 wt % of a conjugated diene-based monomer-derived unit, 15 wt % to 30 wt % of an ethylenic unsaturated nitrile-based monomer-derived unit, and 2.5 wt % to 4.5 wt % of an ethylenic unsaturated acid monomer-derived unit, wherein the carboxylic acid-modified nitrile-based copolymer latex satisfies General Formula 1:1.0 mm/s≤≤3.0 mm/s [General Formula 1]