The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2024

Filed:

Aug. 17, 2022
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Hiroshi Komatsu, Kanagawa, JP;

Tsutomu Yokouchi, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 2/14 (2006.01); B41J 2/18 (2006.01);
U.S. Cl.
CPC ...
B41J 2/14201 (2013.01); B41J 2/18 (2013.01); B41J 2002/14306 (2013.01); B41J 2202/03 (2013.01);
Abstract

Provided are a liquid jetting structure and its applications. The liquid jetting structure includes: a nozzle substrate on which a nozzle for jetting a liquid is formed; and a flow passage substrate on which a liquid flow passage communicating with the nozzle is formed, in which a first layer, a second layer, and a liquid-repellent layer are provided in this order on a jetting surface of the nozzle substrate, the first layer and the second layer are provided in this order on an inner wall of the liquid flow passage, the first layer is a layer containing at least one selected from the group consisting of tantalum oxide, zirconium oxide, titanium oxide, and hafnium oxide, and the second layer is a layer containing at least one selected from the group consisting of SiO, SiC, SiN, SiCN, and SiON.


Find Patent Forward Citations

Loading…