The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2024
Filed:
Aug. 29, 2019
Applicant:
Wacker Chemie Ag, Munich, DE;
Inventor:
Matthias Vietz, Mattighofen, AT;
Assignee:
Wacker Chemie AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B02C 1/00 (2006.01); B02C 1/10 (2006.01); B25D 1/00 (2006.01); B25D 1/14 (2006.01); B25D 9/00 (2006.01); C01B 33/021 (2006.01);
U.S. Cl.
CPC ...
B02C 1/005 (2013.01); B02C 1/10 (2013.01); B02C 2201/00 (2013.01);
Abstract
The present disclosure relates to a method for producing polycrystalline silicon fragments. The process includes (a) providing a polycrystalline silicon rod, (b) working the surface of the silicon rod by means of a hammer or needle hammer to remove at least a portion of a layer of the surface of the polycrystalline silicon rod, and (c) reducing the silicon rod to fragments. Wherein an amount of impact energy expended by the hammer and/or needle hammer is from 1 J to 15 J.