The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2024
Filed:
Jan. 25, 2024
Applicant:
Samsung Display Co., Ltd., Yongin-Si, KR;
Inventors:
Assignee:
Samsung Display Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G03F 1/42 (2012.01); G03F 1/70 (2012.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1288 (2013.01); G03F 1/42 (2013.01); G03F 1/70 (2013.01); G03F 7/0007 (2013.01); G03F 7/2022 (2013.01); H01L 23/544 (2013.01); H01L 2223/54493 (2013.01);
Abstract
A photomask according to an exemplary embodiment includes: a mask substrate; and a first test pattern and a second test pattern disposed along a first edge of the mask substrate, wherein the first test pattern has a first outer shape and a first inner shape, the second test pattern has a second outer shape, and the second outer shape of the second test pattern is larger than the first inner shape of the first test pattern and smaller than the first outer shape of the first test pattern.