The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2024

Filed:

Jul. 27, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventor:

Colin John Dickinson, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); B01D 53/32 (2006.01); B01D 53/68 (2006.01); B01D 53/70 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32844 (2013.01); B01D 53/70 (2013.01); H01J 37/32357 (2013.01); H01J 37/32449 (2013.01); B01D 53/32 (2013.01); B01D 53/68 (2013.01); B01D 2251/102 (2013.01); B01D 2257/204 (2013.01); B01D 2257/2066 (2013.01); B01D 2258/0216 (2013.01); B01D 2259/818 (2013.01); H01J 37/32862 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/334 (2013.01); Y02C 20/30 (2013.01);
Abstract

Implementations of the present disclosure relate to systems for abating F-gases present in the effluent of semiconductor manufacturing processes. In one implementation, a system is provided that includes a water and oxygen delivery system. The water and oxygen delivery system includes a water vapor reagent source fluidly coupled with a chamber foreline via a first conduit; and an oxygen reagent source fluidly coupled with the chamber foreline via a second conduit fluidly coupled with the first conduit. The system further includes a plasma source fluidly coupled with the water and oxygen delivery system via the chamber foreline.


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