The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2024
Filed:
Jan. 10, 2020
Sony Group Corporation, Tokyo, JP;
Sayaka Ogawa, Tokyo, JP;
Kota Aizawa, Tokyo, JP;
SONY GROUP CORPORATION, Tokyo, JP;
Abstract
A configuration that analyzes reflection light of light emitted to a user face and executes both facial-expression analysis and biometric-signal analysis together is realized. The configuration has a light-receiving section that receives reflection light of light emitted to a user face, and a light-reception-signal analyzing section that analyzes a light-reception signal of the light-receiving section. The light-reception-signal analyzing section has a facial-expression analyzing section that analyzes user-skin-surface reflection light and generates facial-expression analysis information, and a biometric-signal analyzing section that analyzes subepidermal reflection light and generates bioanalysis information. The light-reception signal of the light-receiving section includes skin-surface reflection light and subepidermal-tissue reflection light, and the facial-expression analyzing section extracts a low frequency component from the light-reception signal, acquires the skin-surface reflection light, and executes facial-expression analysis. The biometric-signal analyzing section extracts a high frequency component from the light-reception signal, acquires the subepidermal-tissue reflection light, and executes a biometric-signal analysis process.