The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2024

Filed:

Apr. 09, 2021
Applicants:

Beijing Boe Display Technology Co., Ltd., Beijing, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Jiabin Zou, Sr., Beijing, CN;

Xiaofeng Yin, Beijing, CN;

Chunguang Tian, Beijing, CN;

Na Wen, Beijing, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/38 (2012.01); G02F 1/1335 (2006.01); G02F 1/1362 (2006.01);
U.S. Cl.
CPC ...
G03F 1/38 (2013.01); G02F 1/133512 (2013.01); G02F 1/13625 (2021.01);
Abstract

A mask is provided that includes a first graphic region and a second graphic region disposed along a first direction. The first graphic region comprises a first splicing exposure region. The second graphic region comprises a second splicing exposure region. The first splicing exposure region is used for, after being translated along a first vector, forming a first splicing auxiliary region, and the first splicing auxiliary region coincides with the second splicing exposure region.


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