The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2024

Filed:

Jun. 02, 2022
Applicant:

Kimberly-clark Worldwide, Inc., Neenah, WI (US);

Inventors:

Lynda Ellen Collins, Neenah, WI (US);

Mark Alan Burazin, Oshkosh, WI (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D21F 7/08 (2006.01); D21F 11/00 (2006.01); D21H 27/00 (2006.01); D21H 27/02 (2006.01);
U.S. Cl.
CPC ...
D21F 7/08 (2013.01); D21F 11/006 (2013.01); D21H 27/002 (2013.01); D21H 27/02 (2013.01);
Abstract

Disclosed are woven papermaking fabrics having a textured sheet contacting surface with machine and cross-machine direction topography. The machine direction (MD) topography may be imparted by substantially MD oriented protuberances comprising a warp strand supported by a shute strand. The cross-machine direction (CD) topography may be imparted by substantially CD oriented protuberances comprising a shute strand supported by a warp strand. The CD protuberances may extend continuously in the CD and intersect the MD oriented protuberances to form discrete pockets there between. The pockets may have a variety of shapes and size depending on the MD and CD oriented protuberance. In certain instances the pockets may be rectilinear and have a pocket depth greater than 1.0 mm and a pocket angle greater than 28 degrees.


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