The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2024

Filed:

Feb. 25, 2022
Applicants:

Beijing Boe Sensor Technology Co., Ltd., Beijing, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Yiming Wang, Beijing, CN;

Xiaoqiang Yang, Beijing, CN;

Cuiwei Tang, Beijing, CN;

Wei Zhao, Beijing, CN;

Lu Chen, Beijing, CN;

Zixiang Lin, Beijing, CN;

Chuncheng Che, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 3/36 (2006.01); H01Q 3/44 (2006.01);
U.S. Cl.
CPC ...
H01Q 3/36 (2013.01); H01Q 3/44 (2013.01);
Abstract

Provided are an antenna structure, an array antenna and an electronic device. The antenna structure includes a first substrate, a second substrate and a dielectric layer with an adjustable dielectric constant. The first substrate includes a first base and a first and a second radiation phase shift unit. The second substrate includes a second base and a third and a fourth radiation phase shift unit. Orthographic projections of the first and third radiation phase shift units on the first base at least partially overlap. Orthographic projections of the second and fourth radiation phase shift units on the first base at least partially overlap. A first included angle is formed between extending directions of radiation areas of the first and second radiation phase shift units; a second included angle is formed between extending directions of radiation areas of the third and fourth radiation phase shift units.


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