The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2024

Filed:

Dec. 06, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Jeffrey W. Sleight, Ridgefield, CT (US);

Josephine Chang, Bedford Hills, NY (US);

Isaac Lauer, Chappaqua, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); B82Y 10/00 (2011.01); H01L 21/768 (2006.01); H01L 29/06 (2006.01); H01L 29/786 (2006.01); H10K 10/46 (2023.01); H10K 85/20 (2023.01);
U.S. Cl.
CPC ...
H01L 29/66628 (2013.01); B82Y 10/00 (2013.01); H01L 21/76897 (2013.01); H01L 29/0665 (2013.01); H01L 29/0669 (2013.01); H01L 29/66742 (2013.01); H01L 29/78684 (2013.01); H10K 10/46 (2023.02); H10K 85/221 (2023.02);
Abstract

A field effect transistor (FET) includes a substrate; a channel material located on the substrate, the channel material comprising one of graphene or a nanostructure; a gate located on a first portion of the channel material; and a contact aligned to the gate, the contact comprising one of a metal silicide, a metal carbide, and a metal, the contact being located over a source region and a drain region of the FET, the source region and the drain region comprising a second portion of the channel material.


Find Patent Forward Citations

Loading…