The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2024
Filed:
Apr. 01, 2022
Korea Institute of Machinery & Materials, Daejeon, KR;
Center for Advanced Meta-materials, Daejeon, KR;
Jun-Ho Jeong, Daejeon, KR;
Hyeokjung Kang, Daejeon, KR;
Sohee Jeon, Seoul, KR;
Soon-Hyoung Hwang, Daejeon, KR;
Yongrok Jeong, Daejeon, KR;
KOREA INSTITUTE OF MACHINERY & MATERIALS, Daejeon, KR;
CENTER FOR ADVANCED META-MATERIALS, Daejeon, KR;
Abstract
In a wave focusing device and a wave emitting device having the wave focusing device, the wave focusing device has a plurality of filters and focuses a wave by a phase overlap. The plurality of filters includes a first filter formed on a substrate, a second filter formed on the substrate and overlapping with the first filter in a first area, and a third filter formed on the substrate and overlapping with the second filter in a second area. A size of the first area is substantially same as that of the second area. A first portion of the second filter in the first area is inverted to a second portion of the second filter in the second area, with respect to a first axis. A wave passing through the wave focusing device is focused at a center of each of the first, second and third filters.