The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2024

Filed:

Aug. 23, 2019
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Yeshwanth Venkatesha, Bangalore, IN;

Sundeep Krishnadasan, Bangalore, IN;

Ankur Deshwal, Bangalore, IN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/082 (2023.01); G06N 3/04 (2023.01);
U.S. Cl.
CPC ...
G06N 3/082 (2013.01); G06N 3/04 (2013.01);
Abstract

Provided is a method and system with deep learning model generation. The method includes identifying a plurality of connections in a neural network that is pre-associated with a deep learning model, generating a plurality of pruned neural networks by pruning different sets of one or more of the plurality of connections to respectively generate each of the plurality of pruned neural networks, generating a plurality of intermediate deep learning models by generating a respective intermediate deep learning model corresponding to each of the plurality of pruned neural networks, and selecting one of the plurality of intermediate deep learning models, having a determined greatest accuracy among the plurality of intermediate deep learning models, to be an optimized deep learning model.


Find Patent Forward Citations

Venkatesha, Yeshwanth. (2024). Method and system with deep learning model generation (U.S. Patent No. 12165064). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12165064

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