The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2024
Filed:
Apr. 30, 2021
Applicant:
Photronics, Inc., Brookfield, CT (US);
Inventors:
Mohamed Ramadan, Meridian, ID (US);
Michael Green, Boise, ID (US);
Young Ham, Meridian, ID (US);
Christopher J. Progler, Plano, TX (US);
Assignee:
Photronics, Inc., Brookfield, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/70 (2012.01); G06F 30/398 (2020.01); G06T 7/00 (2017.01); G06T 7/13 (2017.01); G06T 7/70 (2017.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G06T 7/001 (2013.01); G06T 7/13 (2017.01); G06T 7/70 (2017.01); G06F 30/398 (2020.01); G06F 2119/18 (2020.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Methods and systems for building a photomask from obtained pattern information relating to a photomask that exhibits defects on wafer. Spatial domain analysis is conducted on the pattern information so that corrective photomask structures can be generated and applied to a photomask layout. A photomask is built using the corrective photomask structures. The photomask is verified for effectiveness.