The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2024

Filed:

Dec. 25, 2020
Applicants:

Chengdu Boe Optoelectronics Technology Co., Ltd., Chengdu, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Tong Niu, Beijing, CN;

Fengli Ji, Beijing, CN;

Chang Luo, Beijing, CN;

Qian Xu, Beijing, CN;

Guomeng Zhang, Beijing, CN;

Yan Huang, Beijing, CN;

Jianbo Li, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23C 14/24 (2006.01); H10K 71/16 (2023.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 14/24 (2013.01); H10K 71/166 (2023.02);
Abstract

A mask sheet for evaporation on a substrate is provided, and the mask sheet includes: a plurality of first ribs extending in a first direction; and a plurality of second ribs extending in a second direction intersecting the first direction, the mask sheet includes a first region for an evaporation of a first exposure region of the substrate and a second region for an evaporation of a second exposure region of the substrate, a third rib is provided at a boundary of the first region and the second region so as to shield an overlapping exposure region between the first exposure region and the second exposure region, the third rib includes a first sub-rib, a second sub-rib, and a spacer for separating the first sub-rib and the second sub-rib, and the third rib has a width greater than that of the first rib.


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