The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2024

Filed:

May. 04, 2020
Applicant:

Orbotech Ltd., Yavne, IL;

Inventors:

Marc Altman, Rehovot, IL;

Zvi Kotler, Tel Aviv, IL;

Itay Peled, Jerusalem, IL;

Oleg Ermak, Netanya, IL;

Sharona Cohen, Nof Ayelon, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/455 (2006.01); B41J 2/435 (2006.01); B41J 2/44 (2006.01); B41J 2/47 (2006.01); B41J 33/14 (2006.01); H05K 3/12 (2006.01);
U.S. Cl.
CPC ...
B41J 2/455 (2013.01); B41J 2/435 (2013.01); B41J 2/442 (2013.01); B41J 2/47 (2013.01); B41J 33/14 (2013.01); H05K 3/1275 (2013.01); H05K 2203/108 (2013.01);
Abstract

Printing apparatus includes a donor supply assembly, which positions a transparent donor substrate having opposing first and second surfaces and a donor film formed on the second surface so that the donor film is in proximity to a target area on an acceptor substrate. An optical assembly directs one or more beams of laser radiation to pass through the first surface of the donor substrate and impinge on the donor film so as to induce ejection of material from the donor film onto the acceptor substrate. Means are provided to mitigate or compensate for the variation in reflection of the laser radiation across an area of the donor substrate, so as to equalize a flux of the laser radiation that is absorbed in the donor film across the area of the donor substrate.


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