The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2024

Filed:

Sep. 14, 2022
Applicant:

Eos Gmbh Electro Optical Systems, Krailling, DE;

Inventors:

Michael Prexler, Munich, DE;

Martin Schade, Munich, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/393 (2017.01); B22F 10/20 (2021.01); B22F 10/25 (2021.01); B22F 10/30 (2021.01); B22F 10/31 (2021.01); B22F 10/366 (2021.01); B22F 12/13 (2021.01); B22F 12/44 (2021.01); B22F 12/45 (2021.01); B22F 12/49 (2021.01); B22F 12/90 (2021.01); B29C 64/153 (2017.01); B29C 64/268 (2017.01); B29C 64/277 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01);
U.S. Cl.
CPC ...
B29C 64/393 (2017.08); B22F 10/25 (2021.01); B22F 12/44 (2021.01); B22F 12/49 (2021.01); B29C 64/153 (2017.08); B29C 64/268 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); B22F 10/20 (2021.01); B22F 10/30 (2021.01); B22F 10/31 (2021.01); B22F 10/366 (2021.01); B22F 12/13 (2021.01); B22F 12/45 (2021.01); B22F 12/90 (2021.01); B29C 64/277 (2017.08); Y02P 10/25 (2015.11);
Abstract

A calibration method serves for calibrating a manufacturing device for additively producing a three-dimensional object by applying layer by layer and selectively solidifying a building material. The manufacturing device comprises at least two scanning units, each of which is capable of directing a beam to different target points in the working plane, which are located within a scanning region assigned to the respective scanning unit, wherein the scanning regions region of the at least two scanning units overlap in an overlap area. At least a first of the at least two scanning units is assigned a first monitoring unit whose monitoring region extends to a target point of the first scanning unit and its proximity, wherein a change of a position of the monitoring region is carried out as a function of a change of a position of the target point.


Find Patent Forward Citations

Loading…