The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2024
Filed:
Jun. 28, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Jennifer Y. Sun, Mountain View, CA (US);
Vahid Firouzdor, San Mateo, CA (US);
David Koonce, Santa Clara, CA (US);
Biraja Prasad Kanungo, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 5/40 (2006.01); B23B 35/00 (2006.01); B24B 31/00 (2006.01); B24B 31/116 (2006.01); B24B 33/02 (2006.01); B24B 57/04 (2006.01);
U.S. Cl.
CPC ...
B24B 31/006 (2013.01); B23B 35/00 (2013.01); B24B 5/40 (2013.01); B24B 31/003 (2013.01); B24B 31/116 (2013.01); B24B 33/02 (2013.01); B24B 57/04 (2013.01); B23B 2220/445 (2013.01); B23B 2226/18 (2013.01);
Abstract
Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 μin.
Sun, Jennifer. (2024). Chamber components with polished internal apertures (U.S. Patent No. 12162115). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12162115
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile