The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2024
Filed:
Feb. 06, 2019
Siemens Energy Global Gmbh & Co. KG, Munich, DE;
Ole Geisen, Berlin, DE;
Siemens Energy Global GmbH & Co. KG, Munich, DE;
Abstract
A method for selectively irradiating a material layer in additive production. The method includes: providing geometry data having geometry information of individual layers of a component that is to be produced by additive means, and defining an irradiation pattern for the layers by a computer-supported production method, wherein the irradiation pattern has a contour and a surface region in layers, wherein first contour vectors of the contour are specified for continuous irradiation operation and second contour vectors of the contour are specified for pulsed irradiation operation. A method for providing a data set, an additive production method, a corresponding device and a corresponding computer program product selectively irradiate a material layer in additive production.