The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2024
Filed:
Aug. 18, 2022
Applicant:
Lutronic Corporation, Seoul, KR;
Inventor:
Kwang Chon Ko, Paju, KR;
Assignee:
LUTRONIC CORPORATION, Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 18/12 (2006.01); A61B 18/14 (2006.01); A61B 18/00 (2006.01);
U.S. Cl.
CPC ...
A61B 18/1206 (2013.01); A61B 18/14 (2013.01); A61B 2018/00452 (2013.01); A61B 2018/00678 (2013.01); A61B 2018/00714 (2013.01); A61B 2018/00767 (2013.01); A61B 2018/00779 (2013.01); A61B 2018/00827 (2013.01); A61B 2018/00875 (2013.01); A61B 2018/00892 (2013.01);
Abstract
The present invention relates to an RF treatment apparatus, the method of controlling the RF treatment apparatus and the skin treatment method using RF energy according to the present invention have an effect in that they can improve the accuracy and efficiency of treatment because whether a target tissue corresponds to a treatment temperature is determined based on impedance of the tissue and the volume of the target tissue corresponding to the treatment temperature can be maximized while maintaining the target tissue to the treatment temperature for a predetermined time.